First AIXTRON CCS MOCVD system for Scandium and Yttrium materials installed at Cornell University

First AIXTRON CCS MOCVD system for Scandium and Yttrium materials installed at Cornell University

Herzogenrath, September 30, 2025 – Cornell University in Ithaca, New York, has purchased a state-of-the-art Close Coupled Showerhead® (CCS) Metal-Organic Chemical Vapor Deposition (MOCVD) system from AIXTRON SE (FSE: AIXA). The new tool will strengthen Cornell’s Materials Science Department and significantly expand its capabilities to research and develop advanced Scandium- and Yttrium-containing materials with promising applications in next-generation electronics.

Cornell’s acquisition is the university’s first AIXTRON CCS MOCVD installation and represents an impactful upgrade to its research infrastructure. The CCS system enables deposition of high-quality, highly uniform thin films—an essential capability for pioneering materials research and for translating laboratory findings into devices. In particular, small incorporations of Scandium (Sc) or Yttrium (Y) into certain material systems can markedly enhance piezoelectric properties. First research reports indicate that only a few percent Sc can increase the piezoelectric coefficient by multiple times, enabling higher current densities or operation at higher frequencies in advanced devices. Yttrium similarly plays a crucial role in tailoring electronic and ferroelectric properties for power-efficient and high-performance components.

What makes this CCS MOCVD tool unique is its capability to handle low-vapor-pressure precursors while enabling process conditions that support higher partial pressures of Scandium during key barrier and active-layer growth steps. For this installation, the tool will be equipped with a newly developed high-temperature source and optimized precursor handling that allow for stable, controllable Sc and Y incorporation without compromising film uniformity. These features permit researchers to explore materials and device designs that were previously difficult to achieve, bridging scientific discovery with scalable process conditions.

“We are incredibly excited to integrate AIXTRON’s CCS MOCVD tool into the Materials Science Department,” said Prof. Hari Nair, Assistant Professor in the Materials Science Department at Cornell University. “This acquisition represents a major step forward in our commitment to pioneering research. The ability to deposit low-vapor-pressure precursors such as Scandium and Yttrium under controlled, high-partial-pressure conditions opens up new pathways for improving piezoelectric and ferroelectric performance — properties that are highly desirable for next-generation power-efficient and high-frequency devices.”

“We are proud to support Cornell University’s Materials Science Department with our CCS MOCVD technology,” said Dr. Felix Grawert, CEO of AIXTRON SE. “Our systems are engineered to meet the demanding conditions required for emerging materials research. The bespoke high-temperature source and advanced precursor management for this tool demonstrate AIXTRON’s commitment to enabling new material chemistries and to translating laboratory innovation into industrially relevant processes.”

Cornell’s acquisition of the CCS MOCVD system represents a significant milestone in the university’s pursuit of research excellence. The university looks forward to the discoveries, device demonstrations and cross-disciplinary collaborations that this tool will enable, including partnerships with industry and academic institutions worldwide.

Contact

Christian Ludwig

Vice President Investor Relations & Corporate Communications

fon +49 (2407) 9030-444

e-mail c.ludwig@aixtron.com

About AIXTRON:

AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. The Company was founded in 1983 and is headquartered in Herzogenrath (near Aachen), Germany, with subsidiaries and sales offices in Asia, United States, and in Europe. AIXTRON´s technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and optoelectronic applications based on compound or organic semiconductor materials. Such components are used in a broad range of innovative applications, technologies and industries. These include Laser and LED applications, display technologies, data transmission, SiC and GaN power management and conversion, communication, signaling and lighting as well as a range of other leading-edge applications.

Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level SolutionS®, Close Coupled Showerhead®, CRIUS®, Gas Foil Rotation®, OVPD®, Planetary Reactor®, PVPD®, TriJet®

For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6) please visit our website at: www.aixtron.com.

Forward-Looking Statements

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